Product Overview
RCH Steamer
Ultra High Purity Wet Oxidation System
High integrity wet oxide growth system delivering precision control of ultra purity steam without the need for hydrogen or a pyrogenic torch.
Key Features:
High-flow steam output up to 50.0 SLM
Hydrogen-free operation for enhanced safety
Ultra high purity steam generation for superior dielectric integrity
Increased uniformity and oxide growth rate
Precision temperature and flow control
No pyrogenic torch required
Lower cost of ownership
VaporGen
High-Flow, No Carrier Gas Alternative to Bubbler Steam Generation
A high-flow steam generator engineered for greater precision, superior uniformity, and budget-friendly cost of ownership over bubbler solutions.
Key Features:
High-Flow steam output up to 12.5 SLM
Superior control and precision utilizing closed-loop PID control
No Carrier Gases Required - only DI Water
Faster oxide growth over traditional bubblers
Superior wafer-to-wafer and within-wafer uniformity
Low cost of ownership
Furnace Processing Systems
Complete Diffusion, Oxidation, & LPCVD Solutions
Comprehensive furnace processing systems for semiconductor and solar applications. Our systems are engineered for precision, reliability, and optimal cost-of-ownership.
Process Solutions:
Robust Oxidation (dry & wet) Solutions utilizing our RCH Steamer Technology
Polysilicon Deposition, Nitride Films, Phosphorous Doping (POCl3), and More
Vacuum Sintering Furnace for accelerated Annealing Processes
ASTRA Control Sytem in all systems
Precise Gas & Temperature Control
Robust Datalogging Capabilities