RCH Associates provides small batch furnace processing systems for research, pilotline and education applications. All RCH diffusion, oxidation and LPCVD processes for semiconductor, solar and science are available.
Link to Available Processes
These research-grade systems include all the features of the RCH production models packaged in a small footprint.
Models:
4612-BT Bench Top Furnace with direct digital temperature control for 50 to 150mm diameter wafers and 125mm
square substrates. Available with optional stand.
6815-BT Bench Top Furnace with direct digital temperature control for 150 to 200mm diameter wafers and 125mm
to 156mm square substrates. Available with optional stand.
4612-R Stand-alone, partitioned furnace system for 50 to 150mm diameter wafers and 125mm square substrates.
Available with the ASTRA Control System. Manual or cantilever loading.
Single-tube, 2, 3 and 4-stack configurations.
6815-R Stand-alone, partitioned furnace system for 50 to 150mm diameter wafers and 125mm to 156mm
square substrates. Available with the ASTRA Control System. Manual or cantilever loading.
Single tube to 4-stack configurations.
Single-tube, 2, 3 and 4-stack configurations.
Link to ASTRA Control System
Full processing subsystems are available for each model configuration including quartz starter kits and peripherals.
Link to Processing Subsystems
